Advanced Vacuum
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Advanced Vacuum is a high tech company established in 1995 with a vision to serve the world with high quality products and support in the field of vacuum and thin film products. In 1997, AV developed their own control system, Concept II, with the thin film and vacuum industry in mind. Between 1998 and 2003 over 50 systems were installed, in prestigious sites such as US Naval Research Labs (Washington D.C., USA), Defence Science and Technology Organisation (Adelaide, Australia) and Raytheon (Lexington, MA, USA).
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The Vision 310 PECVD is fully characterized for a wide range of deposition including : Silicon Oxide, Silicon Nitride, Armophous-Silicon & Silicon Oxy-Nitride.
The Vision 320 RIE is fully characterized for a wide range of etching processes including: Metals, Dielectrics, Silicon, Polyimide & Compound Semiconductors
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